Refurbished Lasers and Optical Components

Services

Parts Support and Service

 

Optical Components & Laser Replacement

 

Optical COmponents

PacTec provides a wide selection of consumable optical components used on micro-photolithography and metrology equipment to support various equipment manufacturers' systems used in the semiconductor industry.

Optical filters: PacTec 2nd Source has the capability to produce filters with wavelengths ranging from g-line (436nm) through ArF (193nm). A majority of our inventory involves parts to support i-line (365.5nm) and KrF (248nm) wavelengths for micro-photolithography systems. We also have the ability to provide optical components used on inspection systems operating at varying wavelengths.

Bandpass or Interference filters: One of our more popular items is the bandpass or interference filter which allows for the transmittance of a narrow range of wavelengths while blocking all others. PacTec can customize the spectral characteristics of an i-line bandpass or interference filter based on your requirements.


Laser Replacement (Repaired and refurbished)

PacTec can provide refurbished lasers used on micro-photolithography and metrology equipment. The lasers are repaired or have new tubes installed. Lasers are tested and come with a warranty.

Laser Types: We repair the laser assembly and/or replace the laser tube used on argon gas lasers and HeNe gas lasers. The laser module is also replaced on DPSS (diode pumped solid state) lasers. These rebuilt lasers are used in an assorted range of wavelengths 488nm, 532nm and 633nm. Some of the various laser manufacturers we can support are Axsys, HP/Agilent, JDS Uniphase, Spectra Physics and Zygo.

Applications: Our refurbished (argon) lasers are used on inspection systems. Some tools within the metrology group also require interferometry lasers (HeNe) for stage positioning. The micro-photolithography systems contain off-axis and on-axis assemblies for multilayer overlay alignment utilizes both DPSS and HeNe lasers. These micro-photolithography systems also require the use of interferometry (stage or reticle positioning) laser assemblies.